In copper plating, a current of 0.5A is allowed for cathode area of 100cm². If this current is maintained constant for 100 minutes, the thickness of the copper deposited will be approximately (the electrochemical equivalent of copper = 0.0003g/°C, density of copper = 104g/cm³ )
10-2mm
10-3mm
10-4mm
10-5mm
10-6mm
Correct answer is E
m = Itz
density = \(\frac{\text{mass}}{\text{area x thickness}}\)
Density = \(\frac{Itz}{A \times h}\)
\(10^4 = \frac{0.5 \times 100 \times 60 \times 0.0003}{100 \times h}\)
h = 9 x 10-7cm = 9 x 10-6mm